NIST Electron Effective-Attenuation-Length Database - SRD 82
The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)].
Complete Metadata
| @type | dcat:Dataset |
|---|---|
| accessLevel | public |
| accrualPeriodicity | irregular |
| bureauCode |
[
"006:55"
]
|
| contactPoint |
{
"fn": "Justin Gorham",
"@type": "vcard:Contact",
"hasEmail": "mailto:justin.gorham@nist.gov"
}
|
| description | The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)]. |
| distribution |
[
{
"title": "DOI Access to NIST Electron Effective-Attenuation-Length Database - SRD 82",
"format": "text/html",
"accessURL": "https://dx.doi.org/10.18434/T4MK5P",
"mediaType": "text/html",
"description": "DOI Access to NIST Electron Effective-Attenuation-Length Database - SRD 82"
},
{
"title": "Form to download the database",
"accessURL": "https://www-s.nist.gov/srd_online/index.cfm?fuseaction=home.main&productID=SRD82v1.3",
"description": "This database is free, but requires that a form be filled out in order to be able to download."
}
]
|
| identifier | ECBCC1C130092ED9E04306570681B10715 |
| keyword |
[
"Auger electron spectroscopy",
"ESCA",
"XPS",
"depth distribution function",
"effective attenuation length",
"electron spectroscopy for chemical analysis",
"material database",
"photoelectron",
"photoelectron spectroscopy",
"photoemission",
"surface analysis",
"x-ray photoelectron spectroscopy"
]
|
| landingPage | https://www.nist.gov/srd/nist-standard-reference-database-82 |
| language |
[
"en"
]
|
| license | https://www.nist.gov/open/license |
| modified | 2011-01-01 00:00:00 |
| programCode |
[
"006:052"
]
|
| publisher |
{
"name": "National Institute of Standards and Technology",
"@type": "org:Organization"
}
|
| references |
[
"https://dx.doi.org/10.1116/1.3071947",
"https://www.nist.gov/system/files/documents/srd/SRD82UsersGuideV1-3.pdf"
]
|
| theme |
[
"Standards:Reference data"
]
|
| title | NIST Electron Effective-Attenuation-Length Database - SRD 82 |
