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Data for "Targeted Chemical Pressure Yields Tunable Millimeter-Wave Dielectric "

Published by National Institute of Standards and Technology | National Institute of Standards and Technology | Metadata Last Checked: August 02, 2025 | Last Modified: 2019-11-20 00:00:00
Included here are figures and other relevant data from the paper "Targeted Chemical Pressure Yields Tunable Millimeter-Wave 5G Dielectric with Unparalleled Performance" published online in Nature Materials on 23 December 2019 (https://doi.org/10.1038/s41563-019-0564-4). Abstract: Epitaxial strain can unlock enhanced properties in oxide materials but restricts substrate choice and maximum film thickness, above which lattice relaxation and property degradation occur. Here we employ a chemical alternative to epitaxial strain by providing targeted chemical pressure, distinct from random doping, to induce a ferroelectric instability with the strategic introduction of barium into today's best millimeter-wave tunable dielectric, the epitaxially strained 50 nm thick n = 6 (SrTiO3)nSrO Ruddlesden-Popper grown on (110) DyScO3. The defect mitigating nature of (SrTiO3)nSrO results in unprecedented low loss at frequencies up to 125 GHz. No barium-containing Ruddlesden-Popper titanates are known, but this atomically-engineered superlattice material, (SrTiO3)n?m(BaTiO3)mSrO, enables low-loss, tunable dielectric properties to be achieved with lower epitaxial strain and a 200 % improvement in the figure of merit at commercially-relevant millimeter-wave frequencies. As tunable dielectrics are key constituents for emerging millimeter-wave high-frequency devices in telecommunications our findings could lead to higher performance adaptive and reconfigurable electronics at these frequencies.

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13 resources available

  • DOI Access for Data for "Targeted Chemical Pressure Yields Tunable Millimeter-Wave Dielectric "

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  • Figure 1: DFT files for the Ba-containing STO Ruddlesden-Popper structures

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  • Figure 2: Data for the X-Ray Diffraction curves of the Ba-containing STO Ruddlesden-Popper films (n=2-6)

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  • Figure 4(a): Data for the complex dielectric constant (K11) vs. frequency curves for the 100 nm Ba-containing STO Ruddlesden-Popper films with n=6

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  • Figure 3(a): Data for the dielectric constant (K11) vs. temperature curves for the Ba-containing STO Ruddlesden-Popper films from n=2-6

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  • Figure 4(b): Data for the dielectric constant tunability vs. applied bias electric field curves for the 100 nm Ba-containing STO Ruddlesden-Popper films from n=6

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  • Figure 3(d): Data for the energy vs. total ionic distortion curves for the Ba-containing and Ba-free STO Ruddlesden-Popper films with n = 2,4,6

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  • Figure 3(b): Data for the ferroelectric transition temperature (Tc) vs. series number (n) plots for the Ba-containing STO Ruddlesden-Popper films from n=2-6

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  • Figure 4(c): Data for the figure of merit (FOM) vs. frequency curves for the 100 nm Ba-containing STO Ruddlesden-Popper films with n=6

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  • Figure 3(c): Data for the lattice parameter (a) / strain vs. series number (n) plot for the Ba-containing STO Ruddlesden-Popper films from n=2-6

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  • Figure 4(a)[inset]: Data for the loss tangent vs. frequency curve for the 100 nm Ba-containing STO Ruddlesden-Popper films with n=6

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  • Resource 13

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