Patent AT-E400063-T1: [Translated] BIPOLAR TRANSISTOR AND PRODUCTION METHOD THEREOF
The invention relates to a semiconductor device (10) with a semiconductor body (12) comprising a bipolar transistor with an emitter region (1), a base region (2) and a collector region (3) of, respectively, a first conductivity type, a second conductivity type, opposite to the first conductivity type, and the first conductivity type, wherein, viewed in projection, the emitter region (1) is positioned above or below the base region (2), and the collector region (3) laterally borders the base region (2). According to the invention, the base region (2) comprises a highly doped subregion (2A) the doping concentration of which has a delta-shaped profile in the thickness direction, and said highly doped sub-region (2A) extends laterally as far as the collector region (3). Such a lateral bipolar transistor has excellent high-frequency properties and a relatively high breakdown voltage between the base and collector regions (2, 3), implying that the device is suitable for high power applications. The doping concentration lies preferably between about 1019 and about 1020 at/cm3, and the thickness of the sub-region (2A) lies between 1 and 15 nm and preferably between 1 and 10 nm. The invention also comprises a method of manufacturing such a device (10).
Complete Metadata
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|---|---|
| accessLevel | public |
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| description | The invention relates to a semiconductor device (10) with a semiconductor body (12) comprising a bipolar transistor with an emitter region (1), a base region (2) and a collector region (3) of, respectively, a first conductivity type, a second conductivity type, opposite to the first conductivity type, and the first conductivity type, wherein, viewed in projection, the emitter region (1) is positioned above or below the base region (2), and the collector region (3) laterally borders the base region (2). According to the invention, the base region (2) comprises a highly doped subregion (2A) the doping concentration of which has a delta-shaped profile in the thickness direction, and said highly doped sub-region (2A) extends laterally as far as the collector region (3). Such a lateral bipolar transistor has excellent high-frequency properties and a relatively high breakdown voltage between the base and collector regions (2, 3), implying that the device is suitable for high power applications. The doping concentration lies preferably between about 1019 and about 1020 at/cm3, and the thickness of the sub-region (2A) lies between 1 and 15 nm and preferably between 1 and 10 nm. The invention also comprises a method of manufacturing such a device (10). |
| distribution |
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"description": "Access the complete Patent AT-E400063-T1: [Translated] BIPOLAR TRANSISTOR AND PRODUCTION METHOD THEREOF on the official website.",
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| identifier | https://healthdata.gov/api/views/r3wu-ytrj |
| issued | 2025-09-05 |
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| landingPage | https://healthdata.gov/d/r3wu-ytrj |
| modified | 2025-09-06 |
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| theme |
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| title | Patent AT-E400063-T1: [Translated] BIPOLAR TRANSISTOR AND PRODUCTION METHOD THEREOF |
